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Proceedings Paper

Development status of a 193-nm immersion exposure tool
Author(s): Takahito Chibana; Hitoshi Nakano; Hideo Hata; Nobuhiro Kodachi; Naoto Sano; Mikio Arakawa; Yoichi Matsuoka; Youji Kawasaki; Sunao Mori; Keiko Chiba
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Paper Abstract

193-nm immersion lithography using water as the immersion fluid is the most promising technology candidate for achieving the 45nm HP node. We have been developing a high NA immersion exposure tool through collaboration with several companies in the industry. This paper presents the results we have obtained on various aspects of immersion exposure system development, and discusses the latest status on the issues that have been explored. In immersion lithography, leaching from resist raises concerns about lens contamination. Using a lens contamination test setup, we examined deposition that is formed on the lens surface when irradiated with a laser. It is estimated from the results that no contamination due to PAG will occur in the exposed area. The test results will be shown in detail. Using our immersion system, no defects have been found so far that are identified as bubble-induced. Therefore, we intentionally obtained bubble-induced defects by introducing micro bubbles into the immersion liquid. The findings will be discussed in this paper. Also, we established our "Immersion Evaluation Laboratory" to facilitate evaluation of all aspects of the immersion lithography process. The laboratory is equipped with (1) 193nm immersion scanner, FPA-6000AS4i with NA 0.85 and a 300mm wafer stage capable of 500mm/s scanning, (2) coater/developer, (3) defect inspection system and (4) SEM. We have performed full-wafer exposure tests using the AS4i, the result of which will be also presented.

Paper Details

Date Published: 15 March 2006
PDF: 9 pages
Proc. SPIE 6154, Optical Microlithography XIX, 61541V (15 March 2006);
Show Author Affiliations
Takahito Chibana, Canon Inc. (Japan)
Hitoshi Nakano, Canon Inc. (Japan)
Hideo Hata, Canon Inc. (Japan)
Nobuhiro Kodachi, Canon Inc. (Japan)
Naoto Sano, Canon Inc. (Japan)
Mikio Arakawa, Canon Inc. (Japan)
Yoichi Matsuoka, Canon Inc. (Japan)
Youji Kawasaki, Canon Inc. (Japan)
Sunao Mori, Canon Inc. (Japan)
Keiko Chiba, Canon Inc. (Japan)

Published in SPIE Proceedings Vol. 6154:
Optical Microlithography XIX
Donis G. Flagello, Editor(s)

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