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Proceedings Paper

Second generation fluids for 193nm immersion lithography
Author(s): Roger H. French; Weiming Qiu; Min K. Yang; Robert C. Wheland; Michael F. Lemon; Aaron L. Shoe; Doug J. Adelman; Michael K. Crawford; Hoang V. Tran; Jerald Feldman; Steve J. McLain; Sheng Peng
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Paper Abstract

Our studies of second generation immersion fluid candidates are moving beyond the discovery phase, and into addressing issues for their commercial application. Thus, we continue work to examine and fundamentally understand fluid transparency and refractive index, to fully optimize these properties. At the same time, we are now examining other process concerns, including index variation with temperature, new imaging performance studies, fluid handling considerations, and fluid property maintenance with active recycle during lithographic exposure. The systems and procedures we have developed in these areas continue to show our fluids' promise for sub-45nm immersion lithography applications.

Paper Details

Date Published: 15 March 2006
PDF: 7 pages
Proc. SPIE 6154, Optical Microlithography XIX, 615415 (15 March 2006);
Show Author Affiliations
Roger H. French, DuPont Co. (United States)
Weiming Qiu, DuPont Co. (United States)
Min K. Yang, DuPont Co. (United States)
Robert C. Wheland, DuPont Co. (United States)
Michael F. Lemon, DuPont Co. (United States)
Aaron L. Shoe, DuPont Co. (United States)
Doug J. Adelman, DuPont Co. (United States)
Michael K. Crawford, DuPont Co. (United States)
Hoang V. Tran, DuPont Co. (United States)
Jerald Feldman, DuPont Co. (United States)
Steve J. McLain, DuPont Co. (United States)
Sheng Peng, DuPont Co. (United States)

Published in SPIE Proceedings Vol. 6154:
Optical Microlithography XIX
Donis G. Flagello, Editor(s)

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