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Proceedings Paper

Pupil and illuminator optimization in partially coherent imaging systems
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Paper Abstract

The ability of optical imaging system to print in a particular node is determined by both CD linearity and resolution characteristics of the system. We present a general (i.e. nonparametric) method of optimization of partially coherent optical system (i.e. both polarizing/nonpolarizing pupil and illuminator) for the printing of any particular set of objects in the best possible printing node. The method turns out to be equivalent to an iterative quadratic-linear programming problem with inequality constraints. Additional requirements, such as, for instance, the focus sensitivity, are introduced naturally as the additional constraints. We present also the results of a hypothetical SLM-based mask writer optimization.

Paper Details

Date Published: 20 March 2006
PDF: 8 pages
Proc. SPIE 6154, Optical Microlithography XIX, 61543U (20 March 2006); doi: 10.1117/12.656357
Show Author Affiliations
Igor Ivonin, Micronic Laser Systems AB (Sweden)
Tor Sandstrom, Micronic Laser Systems AB (Sweden)


Published in SPIE Proceedings Vol. 6154:
Optical Microlithography XIX
Donis G. Flagello, Editor(s)

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