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Proceedings Paper

Applicability of alternating phase shifting masks using polarized light
Author(s): Karsten Bubke; Martin Sczyrba; Christophe Pierrat
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Paper Abstract

The use of Alternating Phase Shifting Masks (APSM) for sub 50nm half pitch pattern using 193nm lithography was evaluated. Results show that polarized illumination may be necessary for APSM to compete with Half-Tone Phase-Shifting Masks (HTPSM) when printing sub 50nm features. The low sigma illumination conditions required for APSM constraints the choice of a possible polarized illuminator to the TE polarized option therefore limiting the patterns to be oriented in one direction. Topography effects imply the use of polarization-dependant balancing of APSM which should not be a show-stopper as long as it is properly handled at the time the mask is manufactured. Due to topography effects, the MEEF is increased if compared to thin mask approximation but the relative numbers remain manageable. The sensitivity of CD errors with respect to polarization errors of the source is comparable to HTPSM masks. The induced displacement due to polarization errors is small compared to the CD variation of the dark line.

Paper Details

Date Published: 21 March 2006
PDF: 11 pages
Proc. SPIE 6154, Optical Microlithography XIX, 615449 (21 March 2006); doi: 10.1117/12.656269
Show Author Affiliations
Karsten Bubke, Advanced Mask Technology Ctr. GmbH & Co. KG (Germany)
Martin Sczyrba, Advanced Mask Technology Ctr. GmbH & Co. KG (Germany)
Christophe Pierrat, Advanced Mask Technology Ctr. GmbH & Co. KG (Germany)

Published in SPIE Proceedings Vol. 6154:
Optical Microlithography XIX
Donis G. Flagello, Editor(s)

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