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Proceedings Paper

Optical, structural, and mechanical properties of gadolinium tri-fluoride thin films grown on amorphous substrates
Author(s): Roland Thielsch; Joerg Heber; Hein Uhlig; Norbert Kaiser
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Paper Abstract

Since excimer laser applications extend to deep and vacuum UV wavelengths at 248 nm, 193 nm and 157 nm, renewed research interest has recently arisen on fluoride thin films due to their unrivaled position as wide-band-gap material for the vacuum UV (VUV). Among these materials, only a very limited number can act as the high refractive index component in multiplayer interference stacks. Besides LaF3, gadolinium tri-fluoride is a potential candidate especially for wavelengths at about and below 200nm. We report on the evaluation of the structural properties, the optical properties with emphasis to the DUV - spectral range, and the mechanical properties of GdF3 single layer by means of XRD, GIXR, AFM measurements, spectral photometry and by ex - situ mechanical stress analysis using the laser beam deflection method to measure the substrate deformation. The samples were deposited onto fused silica and silicon substrates by a low-loss evaporation technology in a BAK 640 coating plant applying various deposition conditions.

Paper Details

Date Published: 4 October 2005
PDF: 12 pages
Proc. SPIE 5963, Advances in Optical Thin Films II, 59630O (4 October 2005); doi: 10.1117/12.625096
Show Author Affiliations
Roland Thielsch, Southwall Europe GmbH (Germany)
Joerg Heber, Fraunhofer Institute of Photonic Microsystems (Germany)
Hein Uhlig, Fraunhofer Institute of Applied Optics and Precision Mechanics (Germany)
Norbert Kaiser, Fraunhofer Institute of Applied Optics and Precision Mechanics (Germany)

Published in SPIE Proceedings Vol. 5963:
Advances in Optical Thin Films II
Claude Amra; Norbert Kaiser; H. Angus Macleod, Editor(s)

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