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Proceedings Paper

Absorption and fluorescence measurements of DUV/VUV coatings
Author(s): Ch. Mühlig; W. Triebel; H. Bernitzki; M. Klaus; J. Bergmann; S. Kufert; S. Bublitz
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Paper Abstract

The performance of optical coatings for high power DUV/VUV laser applications depends amongst others on residual absorption in the thin film layers due to impurities or defects. Using pulsed F2 laser induced fluorescence measurements (LIF), characteristic non-intrinsic emissions of praseodymium, cerium and hydrocarbons are identified for several high reflecting AlF3/LaF3 based mirrors on CaF2 substrates. The separate investigations of single AlF3 and LaF3 layers on silicon wafers indicate that these emissions result from the LaF3 material. The amount of the impurities, however, varies strongly between different LaF3 material grades. The influence of different LaF3 material grades on the absorption properties of high reflecting mirrors is measured for the first time upon ArF laser irradiation using the laser induced deflection technique (LID). Low absorption values of less than 1*10-3 are obtained for all samples. The absorption, however, varies by more than a factor of 2 which is correlated to the appearance of the praseodymium and cerium emissions in the LIF spectra.

Paper Details

Date Published: 4 October 2005
PDF: 8 pages
Proc. SPIE 5963, Advances in Optical Thin Films II, 59630P (4 October 2005); doi: 10.1117/12.625079
Show Author Affiliations
Ch. Mühlig, Institut für Physikalische Hochtechnologie (Germany)
W. Triebel, Institut für Physikalische Hochtechnologie (Germany)
H. Bernitzki, JENOPTIK Laser, Optik, Systeme GmbH (Germany)
M. Klaus, JENOPTIK Laser, Optik, Systeme GmbH (Germany)
J. Bergmann, Institut für Physikalische Hochtechnologie (Germany)
S. Kufert, Institut für Physikalische Hochtechnologie (Germany)
S. Bublitz, Institut für Physikalische Hochtechnologie (Germany)

Published in SPIE Proceedings Vol. 5963:
Advances in Optical Thin Films II
Claude Amra; Norbert Kaiser; H. Angus Macleod, Editor(s)

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