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Proceedings Paper

Multilayers for the EUV and soft X-ray region
Author(s): Zhanshan Wang
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Paper Abstract

To develop beam splitters for soft X-ray laser Mach-Zehder and Michelson interferometer at 13.9 nm, Mo/Si multilayers deposited on back side and both sides of silicon nitride with thickness of 100 nm were fabricated using DC magnetron sputtering. We presented the results of their reflectivity, transmission and probing the electron density of laser-produced plasma using a soft X-ray laser Mach-Zehder interferometer. The design and fabrication of broadband polarizers were also presented in this paper. These polarizers can be used as analyzers for a wideband polarization measurement. We discuss the results obtained with depth-graded Mo/Si multilayer analyzers for 13-19nm polarization measurements. We also discussed the development of X-ray supermirrors used as broadband angular reflectors operating at the fixed energy of 8 keV. We summarized our recent investigation of the design, fabrication and performance of depth-graded W/Si, W/C and W/B4C multilayers.

Paper Details

Date Published: 4 October 2005
PDF: 12 pages
Proc. SPIE 5963, Advances in Optical Thin Films II, 59630S (4 October 2005); doi: 10.1117/12.624988
Show Author Affiliations
Zhanshan Wang, Tongji Univ. (China)

Published in SPIE Proceedings Vol. 5963:
Advances in Optical Thin Films II
Claude Amra; Norbert Kaiser; H. Angus Macleod, Editor(s)

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