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Proceedings Paper

Spectral and spatial measurements of a laser-produced plasma EUV source for 13.5 nm based on a double stream Xe/He gas puff target
Author(s): R. Rakowski; A. Bartnik; H. Fiedorowicz; R. Jarocki; J. Kostecki; J. Krzywiński; J. Mikołajczyk; L. Ryć; M. Szczurek; P. Wachulak
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Paper Abstract

The results of the spectral and spatial measurements of a laser-produced (LPP) plasma source of extreme ultraviolet (EUV) for 13.5 nm are presented. The double stream Xe/He gas puff target in the source was utilizing. The source was equipped with a Nd: YAG laser system (E = 0.55 J, t = 3.9 ns, f = 10 Hz, M2 = 2.5) and was dedicated to EUV metrology purposes. An advantage of this approach of the laser-plasma source is a debris free EUV emission. For the spectral research a transmission grating spectrograph (TGS) and a grazing incidence spectrograph (GIS) were utilized. For spatial measurements a pinhole camera was employed. The influence on EUV emission of the laser focal spot position in relation to the gas puff target and the time delays between opening valves and the laser pulse were investigated.

Paper Details

Date Published: 11 October 2005
PDF: 11 pages
Proc. SPIE 5958, Lasers and Applications, 59582W (11 October 2005); doi: 10.1117/12.622218
Show Author Affiliations
R. Rakowski, Military Univ. of Technology (Poland)
A. Bartnik, Military Univ. of Technology (Poland)
H. Fiedorowicz, Military Univ. of Technology (Poland)
R. Jarocki, Military Univ. of Technology (Poland)
J. Kostecki, Military Univ. of Technology (Poland)
J. Krzywiński, Institute of Physics (Poland)
J. Mikołajczyk, Military Univ. of Technology (Poland)
L. Ryć, Institute of Plasma Physics and Laser Microfusion (Poland)
M. Szczurek, Military Univ. of Technology (Poland)
P. Wachulak, Military Univ. of Technology (Poland)

Published in SPIE Proceedings Vol. 5958:
Lasers and Applications
Krzysztof M. Abramski; Antonio Lapucci; Edward F. Plinski, Editor(s)

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