Share Email Print
cover

Proceedings Paper • new

Influence of deposition temperature and precursor pulse time on properties of SiO2, HfO2 monolayers deposited by PEALD
Author(s): Chaoyi Yin; Meiping Zhu; Chen Song; Tingting Zeng; Nuo Xu; Yanzhi Wang; Yuanan Zhao; Kui Yi; Jianda Shao
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

Plasma-enhanced atomic layer deposition (PEALD) has been widely used in microelectronics due to its precise coating thickness control and high uniformity. Coating qualities are strongly affected by deposition parameters and can be tailored accordingly. In this work, SiO2 and HfO2 monolayers were deposited by PEALD on fused silica and BK7 substrates for different measurement. The influence of deposition temperature and precursor pulse time on both coatings were studied. Coating thickness was obtained by ellipsometer and coating roughness was extracted by atomic force microscope. Laser-induced damage threshold (LIDT) and damage morphology were also studied. By optimizing the process parameters, coatings with desired properties can be deposited.

Paper Details

Date Published: 8 July 2019
PDF: 7 pages
Proc. SPIE 11064, Tenth International Conference on Thin Film Physics and Applications (TFPA 2019), 1106417 (8 July 2019); doi: 10.1117/12.2539917
Show Author Affiliations
Chaoyi Yin, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Meiping Zhu, Shanghai Institute of Optics and Fine Mechanics (China)
Chen Song, Shanghai Institute of Optics and Fine Mechanics (China)
Tingting Zeng, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Nuo Xu, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Yanzhi Wang, Shanghai Institute of Optics and Fine Mechanics (China)
CAS Ctr. for Excellence in Ultra-intense Laser Science (China)
Yuanan Zhao, Shanghai Institute of Optics and Fine Mechanics (China)
Kui Yi, Shanghai Institute of Optics and Fine Mechanics (China)
Jianda Shao, Shanghai Institute of Optics and Fine Mechanics (China)
CAS Ctr. for Excellence in Ultra-intense Laser Science (China)


Published in SPIE Proceedings Vol. 11064:
Tenth International Conference on Thin Film Physics and Applications (TFPA 2019)
Junhao Chu; Jianda Shao, Editor(s)

© SPIE. Terms of Use
Back to Top