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Study on band gap and dispersion model of Al2O3 thin films with different oxygen flow rates by ion beam sputtering
Author(s): Jiahuan He; Dan Chen; Lishuan Wang; Shida Li; Dandan Liu; Yugang Jiang; Meiping Zhu; Huasong Liu
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Paper Abstract

Six groups of single-layer Alumina (Al2O3) thin films with different oxygen flow rate were prepared by ion beam sputtering. The oxygen flow rate changed from 0 sccm to 50 sccm with the interval of 10 sccm. The transmission spectrum, reflection spectrum and ellipsometric reflection spectrum of Al2O3 thin films were analyzed by cody-lorentz model inversion calculation. The surface roughness of six groups of samples was measured by white light interferometer. The effects of oxygen flow on band gap, Urbach band-tail absorption, deposition rate, surface roughness, deposition rate of Al2O3 thin films were studied. The experimental results showed that oxygen flow directly affects the band gap, Urbach tail absorption, deposition rate, surface roughness and deposition rate of Al2O3 thin films.

Paper Details

Date Published: 8 July 2019
PDF: 8 pages
Proc. SPIE 11064, Tenth International Conference on Thin Film Physics and Applications (TFPA 2019), 1106413 (8 July 2019); doi: 10.1117/12.2539622
Show Author Affiliations
Jiahuan He, Tianjin Jinhang Institute of Technical Physics (China)
Joint Lab. of Optoelectronic Materials and Intelligent Surface Structures (China)
Dan Chen, Tianjin Jinhang Institute of Technical Physics (China)
Joint Lab. of Optoelectronic Materials and Intelligent Surface Structures (China)
Lishuan Wang, Tianjin Jinhang Institute of Technical Physics (China)
Joint Lab. of Optoelectronic Materials and Intelligent Surface Structures (China)
Shida Li, Tianjin Jinhang Institute of Technical Physics (China)
Joint Lab. of Optoelectronic Materials and Intelligent Surface Structures (China)
Dandan Liu, Tianjin Jinhang Institute of Technical Physics (China)
Joint Lab. of Optoelectronic Materials and Intelligent Surface Structures (China)
Yugang Jiang, Tianjin Jinhang Institute of Technical Physics (China)
Joint Lab. of Optoelectronic Materials adn Intelligent Surface Structures (China)
Meiping Zhu, Shanghai Institute of Optics and Fine Mechanics (China)
Huasong Liu, Tianjin Jinhang Institute of Technical Physics (China)
Joint Lab. of Optoelectronic Materials and Intelligent Surface Structures (China)


Published in SPIE Proceedings Vol. 11064:
Tenth International Conference on Thin Film Physics and Applications (TFPA 2019)
Junhao Chu; Jianda Shao, Editor(s)

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