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Correlation between the structure and laser damage properties of ion assisted HfO2 thin films
Author(s): Feng Pan; Yaowei Wei; Fei Zhang; Hao Liu
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Paper Abstract

HfO2 thin films were evaporated with ion beam assistance to achieve dense, homogeneous, stoichiometric and low-stress films. The ion beam energy were related to the optical and structural properties of the film. The absorption coefficient and the refractive index were measured by spectrophotometric technique while the microstructure has been studied by means of x-ray diffraction and atomic force microscopy. The correlation between the structure, optical properties and laser damage threshold were analyzed. The results suggest the HfO2 structure and laser damage properties are closely related to the momentum transfer process during film deposition.

Paper Details

Date Published: 8 July 2019
PDF: 6 pages
Proc. SPIE 11064, Tenth International Conference on Thin Film Physics and Applications (TFPA 2019), 110640L (8 July 2019); doi: 10.1117/12.2537175
Show Author Affiliations
Feng Pan, Chengdu Fine Optical Engineering Research Ctr. (China)
Yaowei Wei, Chengdu Fine Optical Engineering Research Ctr. (China)
Fei Zhang, Chengdu Fine Optical Engineering Research Ctr. (China)
Hao Liu, Chengdu Fine Optical Engineering Research Ctr. (China)


Published in SPIE Proceedings Vol. 11064:
Tenth International Conference on Thin Film Physics and Applications (TFPA 2019)
Junhao Chu; Jianda Shao, Editor(s)

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