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Proceedings Paper

The role of film interfaces in near-ultraviolet absorption and pulsed-laser damage in ion-beam-sputtered coatings based on HfO2/SiO2 thin-film pairs
Author(s): S. Papernov; A. A. Kozlov; J. B. Oliver; C. Smith; L. Jensen; D. Ristau; S. Günster; H. Mädebach
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Paper Abstract

The role of thin-film interfaces in the near-ultraviolet absorption and pulsed-laser–induced damage was studied for ion-beam–sputtered coatings comprised of HfO2 and SiO2 thin-film pairs. To separate contributions from the bulk of the film and from interfacial areas, absorption and damage threshold were measured for a one-wave (355-nm)–thick HfO2 single-layer film and for a film containing seven narrow HfO2 layers separated by SiO2 layers. The seven-layer film was designed to have a total optical thickness of HfO2 layers equal to one wave at 355 nm and an E-field peak and average intensity similar to a single-layer HfO2 film. Absorption in both types of films was measured using laser calorimetry and photothermal heterodyne imaging. The results showed a small contribution to total absorption from thinfilm interfaces, as compared to HfO2 film material. The relevance of obtained absorption data to coating near-ultraviolet, nanosecond-pulse laser damage was verified by measuring the damage threshold and characterizing damage morphology. The results of this study revealed a higher damage resistance in the seven-layer coating as compared to the single-layer HfO2 film, in agreement with data recently reported for similarly designed electron-beam–deposited coatings. The results are explained through the similarity of interfacial film structure and structure formed during the co-deposition of HfO2 and SiO2 materials.

Paper Details

Date Published: 23 November 2015
PDF: 12 pages
Proc. SPIE 9632, Laser-Induced Damage in Optical Materials: 2015, 96320B (23 November 2015); doi: 10.1117/12.2196654
Show Author Affiliations
S. Papernov, Univ. of Rochester (United States)
A. A. Kozlov, Univ. of Rochester (United States)
J. B. Oliver, Univ. of Rochester (United States)
C. Smith, Univ. of Rochester (United States)
L. Jensen, Laser Zentrum Hannover e.V. (Germany)
D. Ristau, Laser Zentrum Hannover e.V. (Germany)
S. Günster, Laser Zentrum Hannover e.V. (Germany)
H. Mädebach, Laser Zentrum Hannover e.V. (Germany)

Published in SPIE Proceedings Vol. 9632:
Laser-Induced Damage in Optical Materials: 2015
Gregory J. Exarhos; Vitaly E. Gruzdev; Joseph A. Menapace; Detlev Ristau; MJ Soileau, Editor(s)

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