Share Email Print

Proceedings Paper

Investigating the relationship between material properties and laser-induced damage threshold of dielectric optical coatings at 1064 nm
Author(s): Riccardo Bassiri; Caspar Clark; Iain W. Martin; Ashot Markosyan; Peter G. Murray; Joseph Tessmer; Sheila Rowan; Martin M. Fejer
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

The Laser Induced Damage Threshold (LIDT) and material properties of various multi-layer amorphous dielectric optical coatings, including Nb2O5, Ta2O5, SiO2, TiO2, ZrO2, AlN, SiN, LiF and ZnSe, have been studied. The coatings were produced by ion assisted electron beam and thermal evaporation; and RF and DC magnetron sputtering at Helia Photonics Ltd, Livingston, UK. The coatings were characterized by optical absorption measurements at 1064 nm by Photothermal Common-path Interferometry (PCI). Surface roughness and damage pits were analyzed using atomic force microscopy. LIDT measurements were carried out at 1064 nm, with a pulse duration of 9.6 ns and repetition rate of 100 Hz, in both 1000-on-1 and 1-on-1 regimes. The relationship between optical absorption, LIDT and post-deposition heat-treatment is discussed, along with analysis of the surface morphology of the LIDT damage sites showing both coating and substrate failure.

Paper Details

Date Published: 23 November 2015
PDF: 8 pages
Proc. SPIE 9632, Laser-Induced Damage in Optical Materials: 2015, 963204 (23 November 2015); doi: 10.1117/12.2194784
Show Author Affiliations
Riccardo Bassiri, Stanford Univ. (United States)
Caspar Clark, Helia Photonics Ltd. (United Kingdom)
Iain W. Martin, Univ. of Glasgow (United Kingdom)
Ashot Markosyan, Stanford Univ. (United States)
Peter G. Murray, Univ. of Glasgow (United Kingdom)
Joseph Tessmer, Univ. of Glasgow (United Kingdom)
Sheila Rowan, Univ. of Glasgow (United Kingdom)
Martin M. Fejer, Stanford Univ. (United States)

Published in SPIE Proceedings Vol. 9632:
Laser-Induced Damage in Optical Materials: 2015
Gregory J. Exarhos; Vitaly E. Gruzdev; Joseph A. Menapace; Detlev Ristau; MJ Soileau, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?