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Proceedings Paper

Further advancing the throughput of a multi-beam SEM
Author(s): Thomas Kemen; Matt Malloy; Brad Thiel; Shawn Mikula; Winfried Denk; Gregor Dellemann; Dirk Zeidler
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Paper Abstract

Multiple electron beam SEMs enable detecting structures of few nanometer in diameter at much higher throughputs than possible with single beam electron microscopes at comparable electron probe parameters. Although recent multiple beam SEM development has already demonstrated a large speed increase1, higher throughputs are still required to match the needs of many semiconductor applications2. We demonstrate the next step in the development of multi-beam SEMs by increasing the number of beams and the current per beam. The modularity of the multi-beam concept ensures that design changes in the multi-beam SEM are minimized.

Paper Details

Date Published: 19 March 2015
PDF: 6 pages
Proc. SPIE 9424, Metrology, Inspection, and Process Control for Microlithography XXIX, 94241U (19 March 2015); doi: 10.1117/12.2188560
Show Author Affiliations
Thomas Kemen, Carl Zeiss Microscopy GmbH (Germany)
Matt Malloy, SEMATECH Inc. (United States)
Brad Thiel, SUNY Polytechnic Institute (United States)
Shawn Mikula, Max-Planck-Institute for Medical Research (Germany)
Winfried Denk, Max-Planck-Institute for Medical Research (Germany)
Gregor Dellemann, Carl Zeiss Microscopy GmbH (Germany)
Dirk Zeidler, Carl Zeiss Microscopy GmbH (Germany)

Published in SPIE Proceedings Vol. 9424:
Metrology, Inspection, and Process Control for Microlithography XXIX
Jason P. Cain; Martha I. Sanchez, Editor(s)

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