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Proceedings Paper

Expanded beam spectro-ellipsometry for big area on-line monitoring
Author(s): M. Fried; C. Major; G. Juhasz; P. Petrik; Z. Horvath
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Paper Abstract

Non-destructive analysing tools are needed at all stages of thin film process-development, especially photovoltaic (PV) development, and on production lines. In the case of thin films, layer thicknesses, micro-structure, composition, layer optical properties, and their uniformity are important parameters. An important focus is to express the dielectric functions of each component material in terms of a handful of wavelength independent parameters whose variation can cover all process variants of that material. With the resulting database, spectroscopic ellipsometry coupled with multilayer analysis can be developed for on-line point-by-point mapping and on-line line-by-line imaging. Off-line point-by-point mapping can be effective for characterization of non-uniformities in full scale PV panels or big area (even 450 mm diameter) Si-wafers in developing labs but it is slow in the on-line mode when only 15 points can be obtained (within 1 min) as a 120 cm long panel moves by the mapping station. Last years [M. Fried et al, Thin Solid Films 519, 2730 (2011)], a new instrumentation was developed that provides a line image of spectroscopic ellipsometry (wl=350- 1000 nm) data. Earlier a single 30 point line image could be collected in 10 s over a 15 cm width of PV material. Recent years we have built a 30, a 45 and a 60 cm width expanded beam ellipsometer which speed is increased by 10x. Now, 1800 points can be mapped in a 1 min traverse of a 60*120 cm PV panel or flexible roll-to-roll substrate.

Paper Details

Date Published: 22 June 2015
PDF: 12 pages
Proc. SPIE 9525, Optical Measurement Systems for Industrial Inspection IX, 95251S (22 June 2015); doi: 10.1117/12.2184713
Show Author Affiliations
M. Fried, Research Institute for Technical Physics and Materials Science (Hungary)
C. Major, Research Institute for Technical Physics and Materials Science (Hungary)
G. Juhasz, Research Institute for Technical Physics and Materials Science (Hungary)
P. Petrik, Research Institute for Technical Physics and Materials Science (Hungary)
Z. Horvath, Wigner Research Ctr. for Physics (Hungary)


Published in SPIE Proceedings Vol. 9525:
Optical Measurement Systems for Industrial Inspection IX
Peter Lehmann; Wolfgang Osten; Armando Albertazzi Gonçalves Jr., Editor(s)

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