Share Email Print

Proceedings Paper

Application of frequency domain line edge roughness characterization methodology in lithography
Author(s): Lei Sun; Wenhui Wang; Genevieve Beique; Obert Wood II; Ryoung-Han Kim
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

A frequency domain 3 sigma LER characterization methodology combining the standard deviation and power spectral density (PSD) methods is proposed. In the new method, the standard deviation is calculated in the frequency domain instead of the spatial domain as in the conventional method. The power spectrum of the LER is divided into three regions: low frequency (LF), middle frequency (MF) and high frequency (HF) regions. The frequency region definition is based on process visual comparisons. Three standard deviation numbers are used to characterize the LER in the three frequency regions. Pattern wiggling can be detected quantitatively with a wiggling factor which is also proposed in this paper.

Paper Details

Date Published: 19 March 2015
PDF: 9 pages
Proc. SPIE 9424, Metrology, Inspection, and Process Control for Microlithography XXIX, 942404 (19 March 2015); doi: 10.1117/12.2086961
Show Author Affiliations
Lei Sun, GLOBALFOUNDRIES Inc. (United States)
Wenhui Wang, GLOBALFOUNDRIES Inc. (United States)
Genevieve Beique, GLOBALFOUNDRIES Inc (United States)
Obert Wood II, GLOBALFOUNDRIES Inc. (United States)
Ryoung-Han Kim, GLOBALFOUNDRIES Inc. (United States)

Published in SPIE Proceedings Vol. 9424:
Metrology, Inspection, and Process Control for Microlithography XXIX
Jason P. Cain; Martha I. Sanchez, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?