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Proceedings Paper

Analytical linescan model for SEM metrology
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Paper Abstract

Critical dimension scanning electron microscope (CD-SEM) metrology has long used empirical approaches to determine edge locations. While such solutions are very flexible, physics-based models offer the potential for improved accuracy and precision for specific applications. Here, Monte Carlo simulation is used to generate theoretical linescans from single step and line/space targets in order to build a physics-based analytical model. The resulting analytical model fits the Monte Carlo simulation results for different feature heights, widths, and pitches. While more work is required to further develop this scheme, this model is a candidate for a new class of improved edge detection algorithms for CD-SEMs.

Paper Details

Date Published: 19 March 2015
PDF: 23 pages
Proc. SPIE 9424, Metrology, Inspection, and Process Control for Microlithography XXIX, 94240F (19 March 2015); doi: 10.1117/12.2086119
Show Author Affiliations
Chris A. Mack, (United States)
Benjamin D. Bunday, SEMATECH Inc. (United States)

Published in SPIE Proceedings Vol. 9424:
Metrology, Inspection, and Process Control for Microlithography XXIX
Jason P. Cain; Martha I. Sanchez, Editor(s)

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