Share Email Print
cover

Proceedings Paper

Intra-field patterning control using high-speed and small-target optical metrology of CD and focus
Author(s): Hugo Cramer; Stefan Petra; Bastiaan Onne Fagginger Auer; Henk-Jan Smilde; Baukje Wisse; Steven Welch; Stefan Kruijswijk; Paul Hinnen; Bart Segers; Christian Leewis; Frank Staals; Maryana Escalante Marun; Stuart Young; Wei Guo; Arie den Boef
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

The continuing trend of shrinking dimension and the related specifications requires tightening of control loops. To support the tighter control loops, the metrology sampling plans will require increasing sampling density and frequency. This study shows that tighter control of scanner focus and AEI CD and profile parameters requires sampling schemes with intra-field measurement points, and a frequent update of the corrections. This drives the need for high-speed smalltarget metrology. Experiments show that this can be achieved by the YieldStar angle resolved scatterometer, demonstrating measurements on areas of 16×16μm2 for focus metrology and 12×12μm2 for CD metrology, at a MAM time below 0.5s.

Paper Details

Date Published: 19 March 2015
PDF: 10 pages
Proc. SPIE 9424, Metrology, Inspection, and Process Control for Microlithography XXIX, 94241F (19 March 2015); doi: 10.1117/12.2085957
Show Author Affiliations
Hugo Cramer, ASML Netherlands B.V. (Netherlands)
Stefan Petra, ASML Netherlands B.V. (Netherlands)
Bastiaan Onne Fagginger Auer, ASML Netherlands B.V. (Netherlands)
Henk-Jan Smilde, ASML Netherlands B.V. (Netherlands)
Baukje Wisse, ASML Netherlands B.V. (Netherlands)
Steven Welch, ASML Netherlands B.V. (Netherlands)
Stefan Kruijswijk, ASML Netherlands BV (Netherlands)
Paul Hinnen, ASML Netherlands B.V. (Netherlands)
Bart Segers, ASML Netherlands BV (Netherlands)
Christian Leewis, ASML Netherlands B.V. (Netherlands)
Frank Staals, ASML Netherlands B.V. (Netherlands)
Maryana Escalante Marun, ASML Netherlands B.V. (Netherlands)
Stuart Young, ASML Netherlands B.V. (Netherlands)
Wei Guo, ASML Netherlands BV (Netherlands)
Arie den Boef, ASML Netherlands B.V. (Netherlands)


Published in SPIE Proceedings Vol. 9424:
Metrology, Inspection, and Process Control for Microlithography XXIX
Jason P. Cain; Martha I. Sanchez, Editor(s)

© SPIE. Terms of Use
Back to Top