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Proceedings Paper

Scatterometric analysis of a plasmonic test structure
Author(s): Samuel O'Mullane; Nick Keller; Joseph Race; Brian Martinick; Alain Diebold
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Paper Abstract

Traditional ellipsometric measurements of copper gratings are limited to Angstrom resolution and are rather insensitive to changes in the critical dimension (CD) or pitch of the structure. By adding another grating per- pendicular and with larger CD and pitch, sensitivity is greatly enhanced. The spectra of one dimensional grat- ings is largely featureless over a wide range of CDs while crossed-gratings exhibit large minima which shift with changing CDs of less than an Angstrom. This improvement is due to plasmonic activity in the crossed-grating, demonstrated in detail here. Mueller matrix element analysis under azimuthal rotation provides information about cross-polarization and plasmon coupling conditions.

Paper Details

Date Published: 19 March 2015
PDF: 7 pages
Proc. SPIE 9424, Metrology, Inspection, and Process Control for Microlithography XXIX, 942411 (19 March 2015); doi: 10.1117/12.2085933
Show Author Affiliations
Samuel O'Mullane, SUNY College of Nanoscale Science and Engineering (United States)
Nick Keller, Nanometrics Inc. (United States)
Joseph Race, Nanometrics Inc. (United States)
Brian Martinick, SUNY College of Nanoscale Science and Engineering (United States)
Alain Diebold, SUNY College of Nanoscale Science and Engineering (United States)


Published in SPIE Proceedings Vol. 9424:
Metrology, Inspection, and Process Control for Microlithography XXIX
Jason P. Cain; Martha I. Sanchez, Editor(s)

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