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Proceedings Paper

Spectral emission properties of a LPP light source in the sub-200nm range for wafer inspection applications
Author(s): Nadia Gambino; Bob Rollinger; Duane Hudgins; Reza Abhari; F. Abreau
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Paper Abstract

In this work, the spectral emission proprieties of a droplet-based laser-produced plasma are investigated in the VUV range. These studies are performed with a spectrograph operating from 30 nm to 180 nm at a spectral resolution of 0.1 nm. The emission spectra are recorded for different droplet-based metal fuels such as tin, indium and gallium in the presence of different background gas pressure levels. The experimental results are relevant for alternative light sources that would be needed for future wafer inspection tools. In addition, the experimental results help to determine the Out- Of-Band (OOB) radiation emission of the EUV source. By tuning the type of fuel, the laser energies and the background gas, the LPP light source shows good capabilities to be operated as a tunable light source that covers a spectral emission range from the EUV to the sub-200 nm range.

Paper Details

Date Published: 19 March 2015
PDF: 8 pages
Proc. SPIE 9424, Metrology, Inspection, and Process Control for Microlithography XXIX, 942418 (19 March 2015); doi: 10.1117/12.2085806
Show Author Affiliations
Nadia Gambino, ETH Zürich (Switzerland)
Bob Rollinger, ETH Zürich (Switzerland)
Duane Hudgins, ETH Zürich (Switzerland)
Reza Abhari, ETH Zürich (Switzerland)
F. Abreau, Adlyte Ltd. (Switzerland)

Published in SPIE Proceedings Vol. 9424:
Metrology, Inspection, and Process Control for Microlithography XXIX
Jason P. Cain; Martha I. Sanchez, Editor(s)

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