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Proceedings Paper

Influence of the process-induced asymmetry on the accuracy of overlay measurements
Author(s): Tetyana Shapoval; Bernd Schulz; Tal Itzkovich; Sean Durran; Ronny Haupt; Agostino Cangiano; Barak Bringoltz; Matthias Ruhm; Eric Cotte; Rolf Seltmann; Tino Hertzsch; Eitan Hajaj; Carsten Hartig; Boris Efraty; Daniel Fischer
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Paper Abstract

In the current paper we are addressing three questions relevant for accuracy: 1. Which target design has the best performance and depicts the behavior of the actual device? 2. Which metrology signal characteristics could help to distinguish between the target asymmetry related overlay shift and the real process related shift? 3. How does uncompensated asymmetry of the reference layer target, generated during after-litho processes, affect the propagation of overlay error through different layers? We are presenting the correlation between simulation data based on the optical properties of the measured stack and KLA-Tencor’s Archer overlay measurements on a 28nm product through several critical layers for those accuracy aspects.

Paper Details

Date Published: 19 March 2015
PDF: 9 pages
Proc. SPIE 9424, Metrology, Inspection, and Process Control for Microlithography XXIX, 94240B (19 March 2015); doi: 10.1117/12.2085788
Show Author Affiliations
Tetyana Shapoval, KLA-Tencor GmbH (Germany)
Bernd Schulz, GLOBALFOUNDRIES Inc. (Germany)
Tal Itzkovich, KLA-Tencor Israel (Israel)
Sean Durran, KLA-Tencor (Ireland)
Ronny Haupt, KLA-Tencor GmbH (Germany)
Agostino Cangiano, KLA-Tencor (Italy)
Barak Bringoltz, KLA-Tencor Israel (Israel)
Matthias Ruhm, GLOBALFOUNDRIES Inc. (Germany)
Eric Cotte, GLOBALFOUNDRIES Inc. (Germany)
Rolf Seltmann, GLOBALFOUNDRIES Inc. (Germany)
Tino Hertzsch, GLOBALFOUNDRIES Inc. (Germany)
Eitan Hajaj, KLA-Tencor Israel (Israel)
Carsten Hartig, GLOBALFOUNDRIES Inc. (Germany)
Boris Efraty, KLA-Tencor Israel (Israel)
Daniel Fischer, GLOBALFOUNDRIES Inc. (Germany)

Published in SPIE Proceedings Vol. 9424:
Metrology, Inspection, and Process Control for Microlithography XXIX
Jason P. Cain; Martha I. Sanchez, Editor(s)

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