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Proceedings Paper

Self-actuated, self-sensing cantilever for fast CD measurement
Author(s): Ahmad Ahmad; Tzvetan Ivanov; Alexander Reum; Elshad Guliyev; Tihomir Angelov; Andreas Schuh; Marcus Kaestner; Ivaylo Atanasov; Manuel Hofer; Mathias Holz; Ivo W. Rangelow
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Paper Abstract

The conventional optical lever detection technique involves optical components and its precise mechanical alignment. An additional technical limit is the weight of the optical system, in case a top-scanner is used in high speed and high precision metrology. An alternative represents the application of self-actuated AFM cantilevers with integrated 2DEG piezoresistive deflection sensors. A significant improvement in performance of such cantilevers with respect to deflection sensitivity and temperature stability has been achieved by using an integrated Wheatstone bridge configuration. Due to employing effective cross-talk isolation and temperature drift compensation the performance of these cantilevers was significantly improved. In order to enhance the speed of AFM measurements we are presenting a fast cantilever-approach technology, Q-factor-control and novel adaptive scanning speed procedure. Examples of AFM measurements with high scanning speed (up to 200 lines/s) committed to advanced lithography process development are shown.

Paper Details

Date Published: 19 March 2015
PDF: 12 pages
Proc. SPIE 9424, Metrology, Inspection, and Process Control for Microlithography XXIX, 94240P (19 March 2015); doi: 10.1117/12.2085760
Show Author Affiliations
Ahmad Ahmad, Technische Univ. Ilmenau (Germany)
Tzvetan Ivanov, Technische Univ. Ilmenau (Germany)
Alexander Reum, nano analytik GmbH (Germany)
Elshad Guliyev, Technische Univ. Ilmenau (Germany)
Tihomir Angelov, Technische Univ. Ilmenau (Germany)
Andreas Schuh, Technische Univ. Ilmenau (Germany)
Marcus Kaestner, Technische Univ. Ilmenau (Germany)
Ivaylo Atanasov, nano analytik GmbH (Germany)
Manuel Hofer, nano analytik GmbH (Germany)
Mathias Holz, nano analytik GmbH (Germany)
Ivo W. Rangelow, Technische Univ. Ilmenau (Germany)

Published in SPIE Proceedings Vol. 9424:
Metrology, Inspection, and Process Control for Microlithography XXIX
Jason P. Cain; Martha I. Sanchez, Editor(s)

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