Table of Contents

Foreword

Preface

List of Contributors

List of Acronyms and Abbreviations

1 Photon Source Technology for Lithography and Metrology: An Overview

Vivek Bakshi

1.1 Introduction

1.2 EUV Sources: LPP

1.3 EUV Sources: DPP

1.4 Description of Photons in Sn and Xe Sources

1.5 Other Photon Sources

1.6 EUV Extension and Blue-X

1.7 Summary and Future Outlook

Acknowledgments

References

2 Laser-Produced Plasma Sources for Short-Wavelength Applications Including Lithography and Microscopy

Gerry O’Sullivan, Padraig Dunne, Takeshi Higashiguchi, Takanori Miyazaki, Fergal O'Reilly, and Emma Sokell

2.1 Introduction

2.2 Plasma Considerations

2.3 Conversion Efficiency in Sn UTAs

2.4 Spectroscopic Observations

2.5 Shorter-Wavelength Sources

2.6 Imaging in the Water Window

2.7 Conclusion and Future Perspectives

References

3 Radiation-Hydrodynamics Modeling of LPP EUV Sources

Howard Scott, Steven Langer, and Yechiel Frank

3.1 Introduction

3.2 Plasma Properties

3.3 Laser Absorption

3.4 Thermal Transport

3.5 Hydrodynamics

3.6 Atomic Physics

3.7 Radiation Transport

3.8 Radiation-Hydrodynamics Codes

3.9 Examples

3.10 3.10 Future Trends

Acknowledgment

References

4 Atomic Origins of EUV Light

John Sheil, James Colgan, and Oscar Versolato

4.1 Introduction

4.2 Atomic Structure Calculations: Completeness and Accuracy

4.3 Maxwell–Boltzmann Statistics in Non-LTE Plasma

4.4 Optical Depth in Laser-Produced Tin-Microdroplet Plasma

4.5 Conclusions

References

5 Radiation-Dominated Plasma in LPP Sources: Physical Aspects and Challenges for Numerical Modeling

Mikhail M. Basko

5.1 Introduction

5.2 Main Characteristics and Capabilities of the RALEF-2D Code

5.3 Code Validation by Comparison with Experiments

5.4 Theory of Radiation-Dominated Laser Ablation Fronts

5.5 On the Maximum CE by Steady Ablation of Tin Droplets

5.6 Integrated Simulations of Dual-Pulse Droplet-to-Disk Targets

5.7 Concluding Remarks

Acknowledgments

References

6 EUV Sources for High-Volume Manufacturing

Igor Fomenkov, David C. Brandt, Alexander I. Ershov, Alexander A. Schafgans, Yezheng Tao, Georgiy O. Vaschenko, and Bruno La Fontaine

6.1 Introduction to EUV Light Sources

6.2 EUV Source Requirements

6.3 Laser-Produced Plasma Source System

6.4 Summary

Acknowledgments

References

7 EUV Light Source for Lithography

Hakaru Mizoguchi, Shinji Nagai, Takashi Suganuma, Georg Soumagne, Hiroaki Nakarai, Yoshifumi Ueno, Takashi Saitou, and Tatsuya Yanagida

7.1 Introduction

7.2 Key Technologies of EUV LLP Light Sources

7.3 Gigaphoton’s Engineering Test Stand EUV Light Source

7.4 High-Power HVM LPP-EUV Light Source Development

7.5 Conclusion

References

8 The Electrodeless Z-Pinch Metrology Source

Stephen Horne, Deborah Gustafson, Matthew J. Partlow, Wolfram Neff, Michael Roderick, and Kosuke Saito

8.1 Introduction

8.2 Operating Principles

8.3 Diagnostics for the EQ-10

8.4 Source Performance: Power and Brightness

8.5 Source Performance: Spatial and Temporal Stability

8.6 Operation as a Water Window Microscope Illuminator

8.7 Spectral Measurements

8.8 6.7 nm: Neon Operation

8.9 Conclusion

References

9 High-Brightness Laser-Assisted Discharge-Produced Plasma EUV Source for Mask Inspection and Exposure Applications

Yusuke Teramoto

9.1 Introduction

9.2 LDP Source System Configuration and Its Features

9.3 Dynamics of Discharge-Produced Plasma

9.4 EUV Output Characteristics

9.5 Source Stability and Reliability

9.6 Source Cleanliness

9.7 Comparison with DPP and LPP Sources

Summary

References

10 Compact EUV Sources for Metrology and Irradiation Experiments

Klaus Bergmann, Jochen Vieker, Alexander von Wezyk, and Florian Melsheimer

10.1 Introduction

10.2 Discharge-based EUV Source

10.3 Source-Collector Module

10.4 Summary

Acknowledgments

References

11 The EUV Lamp: A Discharge-Produced Metrology EUV Source

Rainer Lebert, Christoph Phiesel, Thomas Missalla, and Andreas Biermanns-Föth

11.1 Introduction

11.2 Basic Concept and Physics of the EUV-Lamp

11.3 Typical Results Obtained with EUV-Lamp Operation

11.4 Examples of EUV-Lamp Used in EUVL Metrology Systems

11.5 Summary

Acknowledgments

References

12 Laser-Driven Plasma Source Technology and Applications

Huiling Zhu, Toru Fujinami, Xiaohua Ye, Don McDaniel, and Deborah Gustafson

12.1 Introduction: The Benefits of EUV Imaging

12.2 Principles and Characteristics

12.3 Key Features of Laser-Driven Plasma Sources

12.4 Nanometrology Applications

12.5 Applications Outside Metrology Applications

12.6 Challenges and Future Developments

References

13 EUV Source Metrology

Muharrem Bayraktar, Fei Liu, Oscar Versolato, and Fred Bijkerk

13.1 Introduction

13.2 Absolutely Calibrated In-band Energy Measurements

13.3 Broadband Spectroscopy with a Transmission Grating Spectrometer

13.4 Conclusion and Outlook

Acknowledgments

References

14 Collector Optics for EUV Sources

Sascha Migura, Tobias Müller, and Frank Hartung

14.1 Introduction

14.2 Design Concepts

14.3 Far Field

14.4 Wavelength Spectrum and Reflectivity

14.5 Mechanics

14.6 Manufacturing

14.7 Thermal and Contamination Management

14.8 Summary

Acknowledgments

References

15A Grazing Incidence Optics and Applications

Ladislav Pína

15A.1 Introduction

15A.2 Grazing-Incidence X-ray Optics (GIXO) Introduction

15A.3 Rotationally Symmetric GIXO (Parabolic, Ellipsoidal and Wolter Mirrors) as Related to EUV and Soft X-ray Sources

15A.4 Lobster-Eye (LE) and Multi-foil Optics (MFO)

15A.5 Conclusions and Outlook

References

15B Materials Processing with Focused EUV/Soft-X-ray Pulses

Kazuyuki Sakaue

15B.1 Focusing Properties of EUV Pulses by Grazing-Incidence Optics

15B.2 Micro-/Nano-materials Processing with High-Order Harmonics

15B.3 Materials Processing with Energy-Tunable Free-Electron Lasers

15B.4 Conclusions and Outlook

References

15C Irreversible Changes in Materials Exposed to Intense EUV Radiation

Libor Juha

15C.1 Introduction

15C.2 Mechanisms of Irreversible Changes Induced by Intense EUV Radiation

15C.3 Permanent Radiation Damage to EUV Optics

15C.4 Using the Changes for EUV Radiometry

15C.5 Direct Materials Processing by Intense EUV Radiation

15C.6 Conclusions and Outlook

Acknowledgments

References

15D Interaction of Intense EUV Pulses with Atomic and Molecular Gases

Andrzej Bartnik

15D.1 Introduction

15D.2 Laser-Produced Plasma EUV and SXR Sources Based on Gaseous Targets

15D.3 Formation of Intense EUV/SXR Beams Using Grazing Incidence Mirrors

15D.4 Low-Temperature Plasmas Driven by Intense EUV Pulses

15D.5 Numerical Simulation of Emission Spectra

15D.6 Application of EUV-Induced Plasmas for Material Treatment

15D.7 Summary

References

16 Plasma Diagnostics

Kentaro Tomita

16.1 Introduction

16.2 Target Diagnostics Using the Shadowgraph Technique

16.3 Electron Diagnostics

16.4 Ion Diagnostics

16.5 Summary

Acknowledgments

References

17 Synchrotron-based Metrology Tools for EUV Lithography

Charles Tarrio, Robert E. Vest, Frank Scholze, Michael Kolbe, and Yasin Ekinci

17.1 Introduction

17.2 Storage Rings for Metrology Applications

17.3 Optics and Detectors for EUVL

17.4 Synchrotron-Radiation Metrology for EUV Source Applications

17.5 Calibration of Tools for EUV Source Radiometry On Site

References

18 Tin Mitigation in EUV Sources

Gianluca Panici and David N. Ruzic

18.1 Introduction

18.2 Multi-layer Mirror Overview

18.3 Debris Mitigation

18.4 In Situ Tin Cleaning

18.5 MLM Exposure to Hydrogen Plasma

18.6 Summary

References

19 Compact, Efficient CO₂ Amplifiers with Modular Design for High-Efficiency EUV Power Generation

Koji Yasui, Junichi Nishimae, Tatsuya Yamamoto, and Yuzuru Tadokoro

19.1 Background of EUV Applications for the United States

19.2 Concepts of CO₂ Lasers for EUV Generation

19.3 Scalability for > 500-W EUV Powers

19.4 Modular Consideration for a Variety of EUV Applications

19.5 Summary

References

20 Excimer Lasers for Lithography

Hakaru Mizoguchi, Osamu Wakabayashi, Toshihiro Oga, Hiroaki Nakarai, Hiroshi Komori, Kouji Kakizaki, and Junichi Fujimoto

20.1 Introduction

20.2 Excimer-Laser-based Technology for Lithography Applications

20.3 Progress of DUV Lithography

20.4 Summary

References

21 Coherent EUV Light Sources based on High-Order Harmonic Generation Sources—Principles and Applications in Nanotechnology

Henry Kapteyn, Margaret M. Murnane, Yuka Esashi, Michael Tanksalvala, Joshua L. Knobloch, Chen-Ting Liao, Daniel D. Hickstein, Clayton Bargsten, Kevin Dorney, and John Petersen

21.1 Introduction

21.2 Practical Implementation of HHG

21.3 HGG for Generating Coherent 13.5-nm EUV Light

21.4 Nanotechnology Applications

21.5 Summary and Conclusions

References

22 YAG Lasers for Lithography and Metrology

Martin Smrž, Jiří Mužik, and Siva Sankar Nagisetty

22.1 Introduction

22.2 Applications of High-Power Ultrashort-Pulse Lasers in EUV and X-ray Generation

22.3 Fundamental Properties of Laser Gain Media

22.4 Active Materials for Laser Pulse Generation

22.5 Laser Pulse Generation and Amplification

22.6 Geometry of Laser Gain Media for High-Power Lasers

22.7 High-Power Thin-Disk Lasers and Amplifiers

22.8 Kilowatt-Class Pre-pulse Picosecond Yb:YAG Laser System: PERLA^®

22.9 Prospective Developments of Sub-kilowatt Mid-infrared Sub-picosecond Lasers

22.10 Summary

References

23 Solid State 2-μm Laser Drivers for EUV Lithography

Brendan A. Reagan, Thomas Galvin, Issa Tamer, Emily Sistrunk, Thomas Spinka, and Craig W. Siders

23.1 Introduction

23.2 High-Average-Power Pulsed-Solid-State Laser Technology

23.3 Current State-of-the-Art Solid State λ = 2 μm Laser Systems

23.4 Big-Aperture Thulium Laser Concept

23.5 BAT Laser Driver for EUV Lithography

23.6 Summary and Outlook

Acknowledgments

References

24 Accelerators and Compact Storage Rings for Lithography and Metrology

Yasin Ekinci, Terence Garvey, Andreas Streun, and Leonid Rivkin

24.1 Introduction

24.2 A Brief History of Synchrotrons and Storage Rings

24.3 Physics of Synchrotron Radiation

24.4 Basic Feature of Modern Storage Rings

24.5 Compact Storage Rings for Lithography and Metrology

24.6 Conclusions and Future Developments

References

25 High-Power Light Source for EUV Lithography Based on the Energy-Recovery Linac Free-Electron Laser

Hiroshi Kawata, Ryukou Kato, Hiroshi Sakai, Norio Nakamura, and Ryoichi Hajima

25.1 Introduction

25.2 Concept of the ERL-FEL

25.3 Design and Performance of the ERL-FEL

25.4 Design Concept of the Optics from and EUV-FEL to an EUV Scanner

25.5 Efforts to Apply to Industry

25.6 Beyond EUV: Blue-X

25.7 Summary and Outlook

References

26 UV Lamps for Lithography

Hisakazu Ieuji

26.1 Introduction

26.2 Principles, Structure, and Characteristics

26.3 Future Trends

References

Appendix A: Atomic Xenon Data

John D. Gillaspy

A1.1 Introduction

A1.2 Specification of the Subtypes of Fundamental Atomic Data Needed

A1.3 Overview and Current Status of Available Data for Xenon (q = 7 to q = 18)

A1.4 References to Data for the Less-Critical Charge States (q < 7 or q > 18) of Xenon

A1.5 Benchmarking Input Data

A1.6 Benchmarking Output Data

References

Acknowledgments

References (for main text)

Appendix A: International SEMATECH's Fundamental Data Working Group

Appendix B: Xenon Atomic Data

References (for Appendices A and B)

Appendix B: Atomic Tin Data

I. Yu. Tolstikhina, S. S. Churilov, A. N. Ryabtsev, and K. N. Koshelev

A2.1 Introduction

A2.2 Theoretical Approach

A2.3 Results of the Calculations

A2.4 Registration of Sn Plasma Spectra

A2.5 Primary Classification on Charge States

A2.6 Conclusion

Acknowledgments

Appendix: Results of Theoretical Calculation of Sn Ion Spectra

References

Index