Masayuki Shiraishi

Masayuki Shiraishi received a master's degree in materials science from the University of Tokyo in 1998, for the study of photochemical hole-burning of porphyrin-derivative metallocomplexes doped in fluorophosphate glasses.
He joined Nikon Corporation in 1998 and worked on the research and development of x-ray and EUV multilayer coatings, until 2004.
Since 2004, he worked on the system development of projection optics and the study of flare derivation for EUV lithography, until 2011.
Since 2009, he also worked on the study of contamination control and modeling for EUV lithography, until 2011 when the EUV project ended.
Since 2011, he worked on the study and the system development of contamination control, sensing technologies, and thermal stabilization control for ArF and KrF lithography, until 2014.
Since 2014, he has continued the system development of the NGL (new generation lithography) technologies, mainly DSA (directed self-assembly); partially working under the consortium of EIDEC (until 2019).
Since 2016, he also worked on the system development of new lithographic metrology tools, until 2017.
Since 2017, he has continued the system development of optical processing products; and since 2019, he belongs to Next Generation Project Division in Nikon Corporation.