Dr. Luc Martin

I am a engineer in Physics from INSA Toulouse (National Institute of Applied Sciences FRANCE) graduated in 2007. After my diploma I joined the CEA/LETI laboratory where I prepared a thesis on a new writing strategy for electron beam direct write lithography for future technological nodes.
I am now working as an application engineer at ASELTA Nanographics, a start up company from CEA/LETI. We develop a new data preparation software for e-beam lithography (both direct write and mask making). This software covers the complete litho flow from the layout edition to the wafer map and reticle map. It also provides advanced correction strategies to improve the resolution of e-beam tools and reduce the writing time.