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SPIE Advanced Lithography 2018| Register Today

SPIE Journals OPEN ACCESS

SPIE PRESS

Micro/Nano Lithography

Nikon celebrates 100 years

SPIE Classics celebrates the 100th anniversary of Nikon.

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Struggles for opportunity and inclusion are familiar to many women and minorities working to make a career in a STEM.

15 November 2017
from article 4125

SPIE Classics celebrates 100 years of optics education and research at top-ranked institution.

20 October 2017
Alternative fabrication schemes based on concurrent engineering of plasma etching can overcome the limitations inherent in optical lithography and thus help to achieve ever smaller device dimensions.
18 August 2017
The multitrigger resist system is associated with a low cost of ownership and is easily scalable for high-volume manufacturing in future lithography.
14 August 2017
A single photomask is used to align the coordinate systems of two separate metrology tools, to within 25 parts per billion.
9 August 2017
 
J. Alexander Liddle: Metrology at the nanoscale key to understanding of next generation lithography processes