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SPIE Advanced Lithography 2018| Call for Papers

SPIE Journals OPEN ACCESS

SPIE PRESS



Micro/Nano Lithography

Glassy carbon nanolattices fabricated using 3D direct laser writing and pyrolysis are the smallest 3D printed lattice structures to date.
21 June 2017
A new approach enables the fast simulation of chip-scale imprinting, helping to co-optimize layout designs and processing parameters for acceptable yield and throughput in memory manufacturing.
29 May 2017
An emerging lithographic technique offers a promising alternative to electron beam lithography for fabricating new semiconductor devices with both traditional and non-traditional resists.
15 May 2017
Tailored UV-curable inorganic-organic hybrid polymers are experimentally assessed for two-photon absorption lithography.
14 April 2017
A simple and cost-effective sol-gel method produces stable titanium dioxide and titanium oxynitride photoresists, and is compatible with many photolithographic techniques.
10 April 2017
A novel approach to semiconductor fabrication reduces both edge-placement error and the number of required block masks, and has application in device development for the 5nm node and beyond.
16 March 2017