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    BIOS
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The Moscone Center
San Francisco, California, United States
1 - 6 February 2020
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LASE, the industrial laser, laser source, and laser application conference

With 900 papers and presentations, SPIE LASE is the most important laser technologies conference in the field.

Call for Papers opens mid-April. . With 900 papers and presentations, SPIE LASE is the most important laser technologies conference in the field. Topics include laser manufacturing, laser materials processing, micro-nano packaging, fiber, diode, solid state lasers, laser resonators, ultrafast, semiconductor lasers and LEDs, and 3D fabrication technologies.

Thank you for a great week.
See you in 2020.

Topics include

Laser Sources
Nonlinear Optics and Beam Guiding
Micro/Nano Applications
Macro Applications

Recommendations for you

Courses on laser sources, macro/micro/nano applications, nonlinear optics and more
Plenary Talks, which includes three world-class experts LASE Plenary Session
Technical events that include the LASE Interactive Poster Session, Laser Communications technical group, and more
Industy events: which include everything from the basics of later materical processing to the annual Executive Perspectives panel
BiOS Expo (Saturday and Sunday)
Photonics West Exhibition (Tuesday to Thursday)

LASE 2019 Symposium Chairs and Co-Chairs

Beat Neuenschwander, Berner Fachhochschule Technik und Informatik (Switzerland)

Symposium Chair

Beat Neuenschwander
Berner Fachhochschule Technik und Informatik (Switzerland)

Xianfan Xu, Purdue Univ. (USA)

Symposium Chair

Xianfan Xu
Purdue Univ. (USA)

Koji Sugioka, RIKEN (Japan)

Symposium Co-Chair

Koji Sugioka

RIKEN (Japan)

Reinhart Poprawe, Fraunhofer-Institut für Lasertechnik (Germany)

Symposium Co-Chair

Reinhart Poprawe

Fraunhofer-Institut für Lasertechnik (Germany)

LASE 2019 Program Track Chairs

Laser Sources
Kunihiko Washio, Paradigm Laser Research Ltd. (Japan)
John Ballato, Clemson Univ. (United States)


Nonlinear Optics and Beam Guiding

Vladimir Ilchenko, GM Cruise LLC (United States)
Paul O. Leisher, Lawrence Livermore National Lab. (United States)


Micro/Nano Applications

Henry Helvajian, The Aerospace Corp. (United States)
Guido Hennig, Daetwyler Graphics AG (Switzerland)


Macro Applications

Bo Gu, Bos Photonics (United States)
Stefan Kaierle, Laser Zentrum Hannover e.V. (Germany)

SPIE conference papers are published in the Proceedings of SPIE and available via the SPIE Digital Library, the world’s largest collection of optics and photonics research.  

The Proceedings are indexed in Web of Science, Scopus, Ei Compendex, Inspec, Google Scholar, Astrophysical Data System (ADS), DeepDyve, ReadCube, CrossRef, and other scholarly indexes, and are widely accessible to leading research organizations, conference attendees, and individual researchers.

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