• Photomask Technology + Extreme Ultraviolet Lithography
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Monterey Convention Center and Monterey Marriott
Monterey, California, United States
17 - 20 September 2018
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Conferences

Click a conference title below to view the call for papers or to submit an abstract.

SPIE conference papers are published in the Proceedings of SPIE and available via the SPIE Digital Library, the world’s largest collection of optics and photonics research. View Proceedings from last year.


The Proceedings are indexed in Web of Science, Scopus, Ei Compendex, Inspec, Google Scholar, Astrophysical Data System (ADS), DeepDyve, ReadCube, CrossRef, and other scholarly indexes, and are widely accessible to leading research organizations, conference attendees, and individual researchers. 


Important Dates

Abstracts Due:
Late submissions will be considered by the conference chairs. Please contact SPIE Program Coordinator Pat Wight for instructions.

Author Notification: 25 June 2018

Manuscripts Due: 22 August 2018


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