• Photomask Technology + Extreme Ultraviolet Lithography
    Conference and Award Sponsors
    Special Events
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    Hotel in Monterey
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Monterey Marriott
Monterey, California, United States
11 - 14 September 2017
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New in 2017, Photomask Technology colocated with EUV Lithography

Join us in Monterey this September for SPIE Photomask Technology + Extreme Ultraviolet Lithography

Plan to attend SPIE Photomask Technology + Extreme Ultraviolet Lithography 2017 in Monterey, California. Come to this key technical meeting for mask makers, EUVL, emerging technologies, and the future of mask business. New in 2017, SPIE Photomask Technology and the International Conference on Extreme Ultraviolet Lithography are now co-located. 

See you in Monterey this September.

Author Notification
19 June 2017

Manuscripts Due
15 August 2017

Registration increases
25 August 2017

Register today for SPIE Photomask Technology + Extreme Ultraviolet Lithography
Download the Advance Program PDF
Make your hotel reservations

Two conferences coming together

We are pleased SPIE Photomask Technology and Extreme Ultraviolet Lithography will be collocated in Monterey, California this September. 

Photomask Technology Extreme Ultraviolet Lithography
Photomask Technology
  • Computational Lithography
  • Mask Technology
  • Imaging and Emerging Mask Technologies
  • Mask Application
  • Mask Business
Extreme Ultraviolet Lithography
  • Integration in manufacturing
  • Tools, including sources and optics
  • Masks, mask inspection/repair and review
  • Pellicles, mask cleaning and thermal expansion
  • Resist materials/process and contamination
  • Patterning and process enhancement
  • Lithography extendibility
Learn more about Photomask Technology Learn more about the Extreme Ultraviolet Lithography conference

Keynote presentations

Prof. Tsu-Jae King Liu

Prof. Tsu-Jae King Liu
TSMC Distinguished Professorship in Microelectronics Dept. of Electrical Engineering and Computer Sciences Univ. of California, Berkeley (USA)

Dr. Gregory R. McIntyre

Dr. Gregory R. McIntyre
Director, Advanced Patterning
IMEC (Belgium)

Industry meets research

Take advantage of opportunities to network with representatives from leading lithography companies as well as learn about the current status of research impacting progress in EUVL and mask making.

Don't miss the exhibition 12-13 September 2017

Don't miss the exhibition

See the latest advancements from top companies at the exhibition.

See the 2017 Sponsors

See our sponsors

See the organizations helping to support the industry and this event.


Connect with SPIE

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