• Photomask Technology + Extreme Ultraviolet Lithography
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Monterey Convention Center and Monterey Marriott
Monterey, California, United States
17 - 20 September 2018
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SPIE Photomask Technology + EUV Lithography 2018 Call for Papers

SPIE Photomask Technology + EUV Lithography Call for Papers, abstracts due 2 May 2018

Late submissions will be considered by the conference chairs. Please contact SPIE Conference Coordinator Pat Wight for instructions.

Present your research at the semiconductor mask industry’s largest and most important annual event.

This is the key technical meeting for mask makers, emerging mask technologies, and EUV lithography addressing a number of critical topics, including current technical issues, emerging technologies, EUVL technology and infrastructure readiness, and future trends.

Reivew the Call for Papers (PDF)

Abstracts Due
Late submission will be considered by the conference chairs. Please contact SPIE Conference Coordinator Pat Wight for instructions.

Author Notification
25 June 2018

Manuscripts Due
22 August 2018

Two conferences coming together

SPIE Photomask Technology and Extreme Ultraviolet Lithography will again be collocated in Monterey, California. 

Photomask Technology Extreme Ultraviolet Lithography
Photomask Technology
Computational Lithography
Mask Technology
Imaging and Emerging Mask Technologies
Mask Application
Mask Business
Extreme Ultraviolet Lithography
Integration in manufacturing
Tools, including sources and optics
Masks, mask inspection/repair and review
Pellicles, mask cleaning and thermal expansion
Resist materials/process and contamination
Patterning and process enhancement

Lithography extendibility

Learn more about Photomask Technology Learn more about Extreme Ultraviolet Lithography

Submit your abstract today

Click on a conference below to submit your abstract online:

 • Photomask Technology
 • Extreme Ultraviolet Lithography

Proceedings of SPIE

SPIE conference papers are published in the Proceedings of SPIE and available via the SPIE Digital Library, the world’s largest collection of optics and photonics research.  

The Proceedings are indexed in Web of Science, Scopus, Ei Compendex, Inspec, Google Scholar, Astrophysical Data System (ADS), DeepDyve, ReadCube, CrossRef, and other scholarly indexes, and are widely accessible to leading research organizations, conference attendees, and individual researchers. 

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