SPIE Photomask Technology 2011 was the premier conference and exhibition for EUV mask making, emerging mask technologies, and the entire photomask industry: sponsored by SPIE and BACUS.
Bucking the Trend: Driving Changes in How EDA and the Semiconductor Industries Work Together Walden C. Rhines Chairman and Chief Executive Officer, Mentor Graphics
SPIE Photomask 2011 included over 170 presentations on:
Mask Making Topics include: mask data preparation, substrates and materials, patterning tools and processes, resist and resist processing, etch techniques, metrology, inspection, repair, cleaning, contamination, and haze, simulation of mask making.
Emerging Mask Technologies Topics include: EUV mask making, inspection and repair, and infrastructure. Nano imprint mask making and applications. Pixellated masks, alternative mask technologies, mask process correction, grey scale masks, direct write, ML².
Mask Application Topics include: Double- and multi-patterning, resolution enhancement techniques and OPC, source and mask optimization, design for manufacturability, patterned media, simulation and modeling.
Mask Business Mask manufacturing control, mask shop management, mask management in wafer fabs, business aspects of mask, infrastructure.
