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    Past Event Overview

    SPIE Advanced Lithography 2010 Plenary

    SPIE Advanced Lithography concluded on Thursday 3 March 2011. The overall conference attendance increased 11% this year. It's exciting to see the semiconductor industry bouncing back. Thanks to everyone who helped to make this event a success.

    Quote of the Day: “I came up to visit the exhibition and discovered some things I didn't even know existed and ideas I hadn't thought of before. This is a great place to meet smart people." - Brent Bergner, Spectrum Scientific

    Program Information:
     •Daily News - See what happened in San Jose in 2011
     •Photo Gallery - View 2011 photos
     •View Final Technical Program (PDF)
     •View conference abstracts (PDF)
     •View conference proceedings in the SPIE Digital Library (coming soon)
    SPIE Advanced Lithography is:
    •Over 550 technical presentations
    •A 50-company+ exhibition for the industry’s top semiconductor suppliers, integrators, and manufacturers.
    •12 courses - including EUV Lithography, Practical Photoresist Processing, and Electron Beam Inspection.
    •Panel Discussions, Awards, Workshops
    •Social and Networking Events
    •Valuable plenary sessions
     

    Extreme Technology for a Sustainable World

    Luc Van den hove,
    President and CEO, IMEC (Belgium)


     

    Thoughts on Extending Moore's Law
    in the New Decade

    Shang-Yi Chiang,
    Senior VP, Taiwan Semiconductor (Taiwan)

    Go to the current SPIE Advanced Lithography web page