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San Jose Convention Center
San Jose, California, United States
23 - 27 February 2020
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Present your research at the premier event for the lithography community

SPIE Advanced Lithography 2020 in San Jose, California

2020 Call for Papers is open
Participate in the leading global lithography event. Present your work in optical lithography, metrology, or EUV. Share the latest advancements at the meeting where leaders come to solve challenges in lithography, patterning technologies, and materials for the semiconductor industry.

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Abstract Due Date
30 August 2019

Author Notification Date
21 October 2019

Manuscript Due Date
29 January 2020

View the Online Call for Papers
Download the Call for Papers PDF
View the submission guidelines

2020 Conference topics

SPIE Advanced Lithography 2020 call for paper topical areas
• Extreme Ultraviolet (EUV) Lithography
• Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS
• Metrology, Inspection, and Process Control for Microlithography
• Advances in Patterning Materials and Processes
• Optical Microlithography
• Design-Process-Technology Co-optimization for Manufacturability
• Advanced Etch Technology for Nanopatterning

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2019 Proceedings

Proceedings

Did you attend in 2019? Access the papers and presenations. 

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Download the technical program

2019 Program

View the 2019 program to see the papers, special events, and more.

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Watch the plenary presentation

2019 Plenary

Watch the open access recording of "The Future is Quantum" by Dario Gil. 

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Proceedings of SPIE

SPIE conference papers are published in the Proceedings of SPIE and available via the SPIE Digital Library, the world’s largest collection of optics and photonics research.  

The Proceedings are indexed in Web of Science, Scopus, Ei Compendex, Inspec, Google Scholar, Astrophysical Data System (ADS), DeepDyve, ReadCube, CrossRef, and other scholarly indexes, and are widely accessible to leading research organizations, conference attendees, and individual researchers. 

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