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San Jose Convention Center
San Jose, California, United States
23 - 27 February 2020
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The premier event for the lithography community

SPIE Advanced Lithography 2020

Call for Papers opens in May
Participate in the leading global lithography event. Present your work in optical lithography, metrology, or EUV. Share the latest advancements at the meeting where leaders come to solve challenges in lithography, patterning technologies, and materials for the semiconductor industry.

We look forward to seeing everyone in 2020. Take a look back at what happened in 2019.

Call for Papers
opens in May

Abstracts due
21 August 2019

2019 Proceedings

Proceedings

Did you attend in 2019Access the 2019 proceedings and conference presenations. 

View papers
Download the technical program

2019 Program

View the 2019 program to see the papers, special events, and more.

Download PDF
See the open access plenary session recording

2019 Plenary

Watch the open access recording of "The Future is Quantum" by Dario Gil. 

Watch recording

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