San Jose Convention Center
San Jose, California, United States
25 February - 1 March 2018
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Attend the leading event for the lithography community

Register for SPIE Advanced Lithography 2018 in San Jose, California

Join us in San Jose for SPIE Advanced Lithography
Come to the leading global lithography event. Hear the latest advancements in optical lithography, metrology, or EUV. Attend the meeting where leaders come to solve challenges in lithography, patterning technologies, and materials for the semiconductor industry.

Don't miss your chance to connect with the most important people in the semiconductor industry.

Author Notification
23 October 2017

Manuscripts Due
31 January 2018

Registration Prices
increase after 9 February 2018

Featured Sponsor, Canon

Download the 2018 Advance Program PDF
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2018 Plenary speakers

Yan Borodovsky

Yan Borodovsky
Intel Senior Fellow, retired (USA)

G. Dan Hutcheson

G. Dan Hutcheson
CEO and Chairman VSLI Research, Inc. (USA)

Stephen Hsu

Stephen Hsu
ASML Brion US (USA)

7 Conferences and 600 papers

600 technical papers in 2017

View the 2018 conference topic areas:

• Extreme Ultraviolet (EUV) Lithography
• Novel Patterning Technologies
• Metrology, Inspection, and Process Control for Microlithography
• Advances in Patterning Materials and Processes
• Optical Microlithography
• Design-Process-Technology Co-optimization for Manufacturability
• Advanced Etch Technology for Nanopatterning
Take a course at SPIE Advanced Lithography 2018

Courses

Optimal training for career enhancement. 14 courses taught by recognized experts in industry and academia. Courses topics on machine learning, microlithography and more.

Courses
Visit the exhibition

Exhibition

Don't miss the exhibition, where you can see the latest products and meet the industry's top suppliers, integrators, and manufacturers.

Exhibition

Proceedings of SPIE

SPIE conference papers are published in the Proceedings of SPIE and available via the SPIE Digital Library, the world’s largest collection of optics and photonics research.  

The Proceedings are indexed in Web of Science, Scopus, Ei Compendex, Inspec, Google Scholar, Astrophysical Data System (ADS), DeepDyve, ReadCube, CrossRef, and other scholarly indexes, and are widely accessible to leading research organizations, conference attendees, and individual researchers. 

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