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San Jose Convention Center
San Jose, California, United States
25 February - 1 March 2018
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Exhibit at SPIE Advanced Lithography 2018

Exhibit at SPIE Advanced Lithography 2018

Exhibit at SPIE Advanced Lithography, 27-28 February 2018, the largest gathering of lithography experts in the world. For more than 40 years, SPIE Advanced Lithography has been the premier international event that drives the future of lithography research and applications.

 • Reach 2,200 lithography experts
 • Two exhibition days that offer opportunities for face-to-face interaction with potential customers
 • 50 exhibiting companies in 2017

For information on exhibiting, contact Sales: +1 360-676-3290 or spiesales@spie.org

2018 Exhibitor Contract | Online or PDF

2018 Exhibitor and Sponsor Prospectus (PDF)

Become a 2018 Sponsor

Advertising Options for 2018

2018 Exhibitor List

2018 Exhibition Floor Plan

2018 Exhibitor Logistics

Who is at SPIE Advanced Lithography
 • Application and product developers
 • Process engineers
 • Basic and applied researchers
 • Lithography technicians
 • Failure analysis/materials characterization engineers
 • Mico/nanoelectronic engineers
 • Chip designers
 • Mask manufacturers
 • Resist chemists

Featured technologies at the exhibition
 • Lithography: immersion, double patterning, e-beam, EUV, optical/laser, RET
 • Metrology, inspection, OPC, and process control
 • Design and manufacturing software
 • Materials and chemicals
 • Imaging equipment
 • Lasers
 • Resist materials and processing
 • Nano-imprint
 • IC and chip fabrication
 • Nanoscale imaging
 • Etch Technology for nanopatterning

Why companies return year after year
 • 82% rate the quality of attendees as "good" or "excellent"
 • 80% of those surveyed would be "very willing" to recommend SPIE Advanced Lithography to an associate
  Source: exhibitor survey

Contact SPIE Sales:

Teresa Roles-Meier
Teresa Roles-Meier
1 360 685 5445


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