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San Jose Convention Center
San Jose, California, United States
25 February - 1 March 2018
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The semiconductor industry's most important lithography exhibition of the year

SPIE Advanced Lithography 2018 Exhibition - Register today

See global suppliers for lithography research and development, devices, tools, fabrication, and services at the free exhibition. Meet everyone who is anyone in the industry, from semiconductor suppliers and integrators to manufacturers—all in one place.

Register today

2018 Exhibition dates and hours

Tuesday 27 February 10 a.m. to 5 p.m.
Wednesday 28 February 10 a.m. to 4 p.m.

Meet leaders from top companies

 • View the full list of exhibitors 
 • View the exhibition floor plan

Featured technologies

 • Lithography: immersion, double patterning, e-beam, EUV, optical/laser, RET
 • Metrology, inspection, OPC, and process control
 • Design and manufacturing software
 • Materials and chemicals
 • Imaging equipment
 • Lasers
 • Resist materials and processing
 • Nano-imprint
 • IC and chip fabrication
 • Nanoscale imaging
 • Etch Technology for nanopatterning

Interested in participating?

Learn more about exhibiting on the For Exhibitors page
Learn more about sponsorships on the Become a sponsor page

Sign up for information on exhibiting at this event

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