San Jose Marriott and San Jose Convention Center San Jose,
United States 26 February - 2 March 2017
The world's most important gathering of lithography experts
Present and publish at SPIE Advanced Lithography 2017, the world's premier semiconductor lithography event.For over 40 years, SPIE has brought together industry leaders to solve the latest challenges in lithography and patterning in the semiconductor industry.
Call for Papers 2017
See the list below to submit a paper online
Download the 2017 Call for Papers PDF (x MB PDF)
Conference topics for semiconductor lithography
Click on the 2016 topics below to submit your paper:
• Extreme Ultraviolet (EUV) Lithography
• Alternative Lithographic Technologies
• Metrology, Inspection, and Process Control for Microlithography
• Advances in Patterning Materials and Processes
• Optical Microlithography
• Design-Process-Technology Co-optimization for Manufacturability
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SPIE conference papers are published in the Proceedings of SPIE and available via the SPIE Digital Library, the world’s largest collection of optics and photonics research.
The Proceedings are indexed in Web of Science, Scopus, Ei Compendex, Inspec, Google Scholar, Astrophysical Data System (ADS), DeepDyve, ReadCube, CrossRef, and other scholarly indexes, and are widely accessible to leading research organizations, conference attendees, and individual researchers.