• Advanced Lithography
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San Jose Marriott and San Jose Convention Center
San Jose, California, United States
26 February - 2 March 2017
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Don't miss the premier event for the lithography community

Attend SPIE Advanced Lithography
Come to the world's premier lithography event. For over 40 years, SPIE has brought together industry leaders to solve the latest challenges in lithography and patterning in the semiconductor industry.

Register today

Registration prices increase after 10 February

Reserve your hotel today

Manuscripts Due
30 January 2017

Explore the program

Hear from leading lithography experts

Frank E. Abboud
Vice President, Technology and Manufacturing Group General Manager, Intel Mask Operation (USA)

Ben Tsai
Chief Technology Officer and Executive Vice President of Corporate Alliances,
KLA-Tencor Corp.

Nobu Koshiba
President and CEO,
JSR Corp.

Plenaries sponsored by Canon

7 Conferences and 600 papers

View the 2017 SPIE Advanced Lithography conference topic areas

• Extreme Ultraviolet (EUV) Lithography
• Emerging Patterning Technologies
• Metrology, Inspection, and Process Control for Microlithography
• Advances in Patterning Materials and Processes
• Optical Microlithography
• Design-Process-Technology Co-optimization for Manufacturability
• Advanced Etch Technology for Nanopatterning

Courses

Stay competitive. Efficient training for career enhancement, taught by recognized experts in industry and academia. 14 courses in key topical areas.

Courses

Exhibition

28 February – 1 March 2017
Don't miss the exhibition, where you can see the latest products and meet the industry’s top suppliers, integrators, and manufacturers.

Exhibition

Proceedings of SPIE

SPIE conference papers are published in the Proceedings of SPIE and available via the SPIE Digital Library, the world’s largest collection of optics and photonics research. 

The Proceedings are indexed in Web of Science, Scopus, Ei Compendex, Inspec, Google Scholar, Astrophysical Data System (ADS), DeepDyve, ReadCube, CrossRef, and other scholarly indexes, and are widely accessible to leading research organizations, conference attendees, and individual researchers.

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