• Advanced Lithography
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San Jose Marriott and San Jose Convention Center
San Jose, CA, United States
26 February - 2 March 2017
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The world's most important gathering of lithography experts

Call for Papers for SPIE Advanced Lithography in San Jose, California, USA

Present and publish at SPIE Advanced Lithography 2017, the world's premier semiconductor lithography event. For over 40 years, SPIE has brought together industry leaders to solve the latest challenges in lithography and patterning in the semiconductor industry.

Call for Papers 2017
 • See the list below to submit a paper online
 • Download the 2017 Call for Papers PDF (x MB PDF)

Conference topics for semiconductor lithography

Click on the 2016 topics below to submit your paper:
• Extreme Ultraviolet (EUV) Lithography
• Alternative Lithographic Technologies
• Metrology, Inspection, and Process Control for Microlithography
• Advances in Patterning Materials and Processes
• Optical Microlithography
• Design-Process-Technology Co-optimization for Manufacturability
• Advanced Etch Technology for Nanopatterning

Review the 2016 Event
 • Onsite news and photos
 • Final Technical Program (4 MB PDF)
 • Technical Abstracts (1 MB PDF)
 • Exhibition Guide (7 MB PDF)

Doug Resnick of Canon Nanotechnologies

View this video on the value of attending SPIE Advanced Lithography

SPIE conference papers are published in the Proceedings of SPIE and available via the SPIE Digital Library, the world’s largest collection of optics and photonics research.  

The Proceedings are indexed in Web of Science, Scopus, Ei Compendex, Inspec, Google Scholar, Astrophysical Data System (ADS), DeepDyve, ReadCube, CrossRef, and other scholarly indexes, and are widely accessible to leading research organizations, conference attendees, and individual researchers. 

Join SPIE in celebration of:

Accepted Papers
If accepted, your research will be published in the SPIE Digital Library

Become part of the world's largest collection
of optics and photonics research papers.

Present at SPIE Advanced Lithography
Dynamic | Diverse | Current | Collaborative

Publish in SPIE Proceedings
Timely | Relevant | Cited | Indexed

We welcome your participation.


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Important Dates

Abstracts Due
6 September 2016

Author Notification
24 October 2016

Manuscripts Due
30 January 2017

SPIE Advanced Lithography 2016 Proceedings Available

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