• Advanced Lithography 2016
    For Authors/Presenters
    For Chairs/Committees
    For Exhibitors
San Jose Marriott and San Jose Convention Center
San Jose, California, United States
21 - 25 February 2016
Print PageEmail Page

SPIE Advanced Lithography, the #1 conference for the lithography community

SPIE Advanced Lithography 2015 40-year Anniversary

SPIE Advanced Lithography, the premier conference for the lithography community. For 40 years, SPIE has brought together industry leaders to solve the latest challenges in lithography and patterning in the semiconductor industry.

2016 Call for Papers opens in May 2015

Review the 2015 Program
2015 Event News and Photos
2015 Final Technical Program (4 MB PDF)
2015 Technical Abstracts (1 MB PDF)
2015 Exhibition Guide (2 MB PDF)

A variety of events, all in one week
500 presentationsspecial events * courses * exhibition

2015 Plenary Speakers
 Dr. Xiaowei Shen

Internet-of-Things: Cloud Platform and Industry Solutions
Dr. Xiaowei Shen
Director, IBM Research,

 Dr. Tsu-Jae King Liu

Sustaining the Silicon Revolution: From 3D Transistors to 3D Integration
Dr. Tsu-Jae King Liu
Chair of the Dept. of Electrical Engineering and Computer Sciences,
Univ. of California, Berkeley

View Dr. Tsu-Jae King Liu's 2015 presentation

 Dr. Alan Willner

Activities of the National Photonics Initiative
Dr. Alan Wilner
Sample Chaired Professor of Engineering,
Univ. of Southern California

View Dr. Alan Wilner's 2015 presentation

Plenaries sponsored by:
2015 Conference Topic Areas
• Extreme Ultraviolet (EUV) Lithography
• Alternative Lithographic Technologies
• Metrology, Inspection, and Process Control for Microlithography
• Advances in Patterning Materials and Processes
• Optical Microlithography
• Design-Process-Technology Co-optimization for Manufacturability
• Advanced Etch Technology for Nanopatterning
Subscribe to Updates
The Advanced Lithography Exhibition
Come meet the industry's top semiconductor suppliers, integrators, and manufacturers. For 40 years SPIE Advanced Lithography has been the premier international event that drives the future of lithography research and applications and the exhibition is where you can see the latest products and meet with the leaders in the field.
Learn more on the Exhibition website

SPIE.TV: The latest advances in lithography


SPIE logo

Important Author Dates

Abstract Due Date
8 September 2015

Author Notification
22 October 2015

Manuscripts Due
25 January 2016

Browse Defense, Security, and Sensing 2011 papers

Sign Up for Email Updates
Receive email updates on SPIE Advanced Lithography.