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San Jose Marriott and San Jose Convention Center
San Jose, California, United States
22 - 26 February 2015
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Abstracts due date extended to 22 September

Call for Papers for SPIE Advanced Lithography in San Jose, California, United States

Call for Papers for SPIE Advanced Lithography 2015. Participate at the premier conference for the lithography community in its 40th year. To meet the needs of the lithography community, the abstract due date has been extended to 22 September.

Call for Papers (2 MB PDF)

View conference topics

Papers willl be accepted in the following areas:
Extreme Ultraviolet (EUV) Lithography
Alternative Lithographic Technologies
Metrology, Inspection, and Process Control for Microlithography
Advances in Patterning Materials and Processes
Optical Microlithography
Design-Process-Technology Co-optimization for Manufacturability
Advanced Etch Technology for Nanopatterning
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Why authors present their work at SPIE Advanced Lithography:

“For anyone working in lithography it is exactly the correct audience.”
“The most important symposium on lithography.”
“Best forum to gain attention from industry decision-makers.”
Exhibition

SPIE Advanced Lithography Exhibition, 24 - 25 February, is a highly regarded exhibition for the industry's top semiconductor suppliers, integrators, and manufacturers. 61 exhibiting companies in 2014.

 • Connect with the largest gathering of lithography experts in the world (2,300 attendees from 31 countries including the US, Japan, Germany, Taiwan, Korea, Netherlands, Isreal, and China)
 • Get face-to-face interaction with potential customers from 5 days of presentations, courses, and special events
 • Access to free business and industry events

SPIE.TV: The latest advances in lithography

See what happened last year
 • See what happened in 2014: onsite news and photos
 • Technical Program (PDF 6 MB)
 • Exhibition Guide (PDF 4 MB)
 • Technical Abstracts (PDF 2 MB)


Accepted Papers

If accepted, your research will be published in the SPIE Digital Library

Become part of the world's largest collection
of optics and photonics research papers.

Present at SPIE Advanced Lithography
Dynamic | Diverse | Current | Collaborative

Publish in SPIE Proceedings
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We welcome your participation.

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Important Author Dates

Abstract Due Date Extended
8 September 2014
22 September 2014

Author Notification
20 October 2014

Manuscripts Due
26 January 2015


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