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SPIE Advanced Lithography 2017 news and photos

Conference Topics

Plenary Presentations

Technical Events

Social & Networking Events

2017 Awards




Welcome to #SPIElitho in San Jose, California!

SPIE Advanced Lithography 2016 panel



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2017 Advanced Lithography Conference Topics


Frits Zernike Award − Monday 27 February


Plenary Presentations − Hear from the leading lithography experts!

  • Frank Abboud, Intel Mask Operation (USA) on "Photomask Challenges for Upcoming Technology Nodes"
  • Ben Tsai, KLA-Tencor Corp on "Inspection and Metrology to Support the Quest for Perfection: Photolithography for the Sub-10nm Nodes"
  • Nobu Koshiba, JSR Corp. on "Materials Innovation: It's No Longer Only About Resolution"


Technical Events

  • Nanotechnology in Microlithography Panel Discussion "Beyond Moore: Nanotechnology Surpassing the Roadmap":  Monday 27 February
  • Interactive Poster Sessions: Tuesday 28 February and Wednesday 1 March


Social and Networking Events

  • SPIE Fellows Luncheon − Monday 27 February
  • All-Symposium Welcome Reception − Monday 27 February

2017 Awards − Industry-sponsored Best Paper Awards


Courses14 topics in key areas: efficient training for career enhancement, taught by recognized experts in industry and academia


Exhibition − 28 February and 1 March

The industry's most important exhibition for lithography research and development, devices, tools, fabrication, and services - register for free and learn more here!


SPIE Advanced Lithography 2016 rooftop reception


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on social media:


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SPIE Advanced Lithography

26 February – 2 March 2017
San Jose, California, USA



See reports, photos, and video
from last year's event