Post-deadline submissions will be considered for the poster session, or oral session if space becomes available

This long standing and well-attended conference features interferometry, structured light, and and optical metrology techniques and applications. The techniques enable non-contact inspection of a wide range of objects from macro-scale to nano-scale, and surface finishes from super-polished to structured or randomly rough. Applications in research laboratories, industrial manufacturing, and standardization institutes that rely on the precision, reliability, and flexibility of these techniques steer the industry toward new horizons. For example, applications in new technologies such as creating sustainable product using new materials, MEMS/MOEMS, biomedical devices and light weighted segmented mirrors have pushed the field toward ever more challenging new solutions. These new developments have greatly impacted the science of optical measurements and instruments.

Authors with topics related to interferometry, structured light, and optical metrology are encouraged to submit contributions to this conference. This conference is expected to receive 40-60 papers covering the latest advances in areas relating to techniques and applications of interferometry and fringe analysis methods. Recent progress and next-generation developments will be highlighted. Invited talks will be included with regular conference talks and poster presentations. The meeting will encompass 2-3 days and avoid parallel sessions. In addition, sufficient time will be allotted for visiting the poster sessions and exhibits.

Submission Instructions:
This conference gives acceptance priority to authors who submit an extended abstract of their work.

This extended abstract must be submitted as a supplemental file during the abstract submission process. This file must be a PDF using the SPIE template of 2-3 pages. It should clarify the novelty of the work being presented and may include figures, test results, and references.

We expect all presenters to prepare more extended proceedings manuscripts by the manuscript deadline as a requirement to present an oral presentation at the meeting. All manuscripts will be peer reviewed. Exceptions will be considered on a case-by-case basis.

Manuscript guidelines: "https://spie.org/OP/Manuscript-Submission-Guidelines"


Papers are solicited on the following and related topics:

1. Advanced Measurement Techniques:
2. Industrial Metrology and Quality Control:
3. Biomedical and Life Sciences Applications:
4. Astronomy and Space Optics:
5. Cross-Scale Measurements and Integration:
6. Emerging Interdisciplinary Areas:
We will have a "Fringe Art" Competition: Bring your favorite fringe pattern to display.;
In progress – view active session
Conference 13135

Interferometry and Structured Light 2024

This conference is no longer accepting submissions.
Late submissions may be considered subject to chair approval. For more information, please contact Courtney Kendall.
Abstract Due: 7 February 2024
Author Notification: 29 April 2024
Manuscript Due: 31 July 2024
Post-deadline submissions will be considered for the poster session, or oral session if space becomes available

This long standing and well-attended conference features interferometry, structured light, and and optical metrology techniques and applications. The techniques enable non-contact inspection of a wide range of objects from macro-scale to nano-scale, and surface finishes from super-polished to structured or randomly rough. Applications in research laboratories, industrial manufacturing, and standardization institutes that rely on the precision, reliability, and flexibility of these techniques steer the industry toward new horizons. For example, applications in new technologies such as creating sustainable product using new materials, MEMS/MOEMS, biomedical devices and light weighted segmented mirrors have pushed the field toward ever more challenging new solutions. These new developments have greatly impacted the science of optical measurements and instruments.

Authors with topics related to interferometry, structured light, and optical metrology are encouraged to submit contributions to this conference. This conference is expected to receive 40-60 papers covering the latest advances in areas relating to techniques and applications of interferometry and fringe analysis methods. Recent progress and next-generation developments will be highlighted. Invited talks will be included with regular conference talks and poster presentations. The meeting will encompass 2-3 days and avoid parallel sessions. In addition, sufficient time will be allotted for visiting the poster sessions and exhibits.

Submission Instructions:
This conference gives acceptance priority to authors who submit an extended abstract of their work.

This extended abstract must be submitted as a supplemental file during the abstract submission process. This file must be a PDF using the SPIE template of 2-3 pages. It should clarify the novelty of the work being presented and may include figures, test results, and references.

We expect all presenters to prepare more extended proceedings manuscripts by the manuscript deadline as a requirement to present an oral presentation at the meeting. All manuscripts will be peer reviewed. Exceptions will be considered on a case-by-case basis.

Manuscript guidelines: "https://spie.org/OP/Manuscript-Submission-Guidelines"


Papers are solicited on the following and related topics:

1. Advanced Measurement Techniques:
  • Active and real-time measurement systems
  • Atom interferometry
  • Calibration and standardization methods
  • Digital holography and speckle techniques
  • Fringe analysis techniques
  • Grating and grid (moiré) methods
  • Interferometric fiber optic sensors
  • Phase measurement techniques
  • Polarization and geometric-phase techniques
  • Shearing interferometry and other gradient methods
  • White light interferometry and optical coherence tomography

2. Industrial Metrology and Quality Control:
  • Automotive, aerospace, and other industrial applications
  • Automated measurements
  • Freeform, mid-spatial frequency, and roughness measurement
  • High-speed 3D metrology
  • MEMS/MOEMS reliability analysis, assembly, and packaging testing
  • Nondestructive testing and failure analysis
  • Stress and strain analysis
  • Surface profiling
  • Thin-film metrology
  • X-ray and high-energy optics characterization

3. Biomedical and Life Sciences Applications:
  • Bio-interferometry to measure and image cells and tissues
  • Biological and pharmaceutical applications
  • Nano-metrology
  • Optical projection tomography techniques

4. Astronomy and Space Optics:
  • Astronomical and adaptive optics through micro optics testing
  • Gravitational wave interferometry
  • Terahertz techniques and applications

5. Cross-Scale Measurements and Integration:
  • Distance and shape measurements across multiple scales
  • Interaction between modeling, simulation, and experiments
  • Integrated optical interferometry
  • Materials, structural analysis, and testing
  • Semiconductor wafer inspection, photolithography mask metrology, and inspection

6. Emerging Interdisciplinary Areas:
  • High-speed 3D metrology
  • Intelligent metrology systems
  • Sustainable product metrology
  • Machine Learning
  • Materials, structural analysis, and testing
  • Tunable wavelength, spectral interferometry, and wavelength-dependent methods
  • to 1/∞ and beyond.

We will have a "Fringe Art" Competition: Bring your favorite fringe pattern to display.
Conference Chair
4D Technology Corp. (United States)
Conference Chair
Optineering (United States), The Univ. of Arizona (United States)
Conference Chair
Purdue Univ. (United States)
Conference Co-Chair
The Univ. of North Carolina at Charlotte (United States)
Conference Co-Chair
Warsaw Univ. of Technology (Poland)
Program Committee
Norwegian Univ. of Science and Technology (Norway)
Program Committee
Univ. Federal de Santa Catarina (Brazil)
Program Committee
Stanford Univ. School of Medicine (United States)
Program Committee
Onto Innovation Inc. (United States)
Program Committee
Fraunhofer-Institut für Optronik, Systemtechnik und Bildauswertung IOSB (Germany)
Program Committee
ASML (United States)
Program Committee
U.S. Naval Research Lab. (United States)
Program Committee
Zygo Corporation (United States)
Program Committee
Univ. of Galway (Ireland)
Program Committee
The Univ. of North Carolina at Charlotte (United States)
Program Committee
Liège Univ. (Belgium)
Program Committee
Nikon Research Corp. of America (United States)
Program Committee
National Institute of Standards and Technology (United States)
Program Committee
Wyant College of Optical Sciences (United States)
Program Committee
Iowa State Univ. of Science and Technology (United States)
Program Committee
Centro de Investigaciones en Óptica, A.C. (Mexico)
Program Committee
Ruda-Cardinal, Inc. (United States)
Program Committee
4D Technology Corp. (United States)
Program Committee
Apre Instruments, Inc. (United States)
Program Committee
Utsunomiya Univ. (Japan)
Program Committee
4D Technology Corp. (United States)
Program Committee
Warsaw Univ. of Technology (Poland)
Program Committee
MetroLaser, Inc. (United States)
Program Committee
Air Force Research Lab. (United States)
Additional Information

View call for papers

 

What you will need to submit

  • Title
  • Author(s) information
  • Speaker biography (1000-character max including spaces)
  • Abstract for technical review (200-300 words; text only)
  • Summary of abstract for display in the program (50-150 words; text only)
  • Keywords used in search for your paper (optional)
  • Check the individual conference call for papers for additional requirements (i.e. extended abstract PDF upload for review or instructions for award competitions)
Note: Only original material should be submitted. Commercial papers, papers with no new research/development content, and papers with proprietary restrictions will not be accepted for presentation.